%0 Generic
%T Surface Modification with Orthogonal Photosensitive Silanes for Sequential Chemical Lithography and Site‐Selective Particle Deposition
%A del Campo, Aránzazu
%A Boos, Diana
%A Spiess, Hans Wolfgang
%A Jonas, Ulrich
%I Wiley
%@ 1433-7851
%@ 1521-3773
%K General Chemistry
%K Catalysis
%D 2005
%C Wiley
%U http://slubdd.de/katalog?TN_libero_mab2
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