%0 Generic
%T Chemical vapor deposition of ruthenium-based layers by a single-source approach
%A Jeschke, Janine
%A Möckel, Stefan
%A Korb, Marcus
%A Rüffer, Tobias
%A Assim, Khaybar
%A Melzer, Marcel
%A Herwig, Gordon
%A Georgi, Colin
%A Schulz, Stefan E.
%A Lang, Heinrich
%I Royal Society of Chemistry (RSC)
%@ 2050-7534
%@ 2050-7526
%D 2016
%C Royal Society of Chemistry (RSC)
%U http://slubdd.de/katalog?TN_libero_mab2
Download citation