> Verlagsreihe
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Vol. 12:
Computational modelling of nanoparticles Bromley, Stefan T.; Woodley, Scott M
Amsterdam; Oxford; Cambridge, MA: Elsevier, [2019]
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Volume 11:
Materials and processes for next generation lithography edited by Alex Robinson (University of Birmingham, Birmingham, United Kingdom), Richard Lawson (Milliken & Company, Spartanburg, SC, United States)
Amsterdam; Boston; Heidelberg; London; New York; Oxford; Paris; San Diego; San Francisco; Singapore; Sydney; Tokyo: Elsevier Inc., [2016]
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1:
Nanostructured materials ed. by Gerhard Wilde
Amsterdam; Heidelberg [u.a.]: Elsevier, 2009