author = { Omura, Y. AND Nakashima, S. AND Izumi, K. AND Ishii, T. },

title = { 0.1- mu m-gate, ultrathin-film CMOS devices using SIMOX substrate with 80-nm-thick buried oxide layer },

publisher = {Institute of Electrical and Electronics Engineers (IEEE)},

isbn = {0018-9383},

keywords = { Electrical and Electronic Engineering , Electronic, Optical and Magnetic Materials },

year = {1993},

url = { http://slubdd.de/katalog?TN_libero_mab2 }