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  2. Suzuki, Kazuaki; Hirayanagi, Noriyuki; Fujiwara, Tomoharu; Yamada, Atsushi; Ikeda, Junji; Yahiro, Takehisa; Kojima, Shinichi; Udagawa, Jin; Yamamoto, Hajime; Katakura, Norihiro; Suzuki, Motoko; Aoyama, Takashi; Takekoshi, Hidekazu; Umemoto, Takaaki; Shimizu, Hiroyasu; Fukui, Saori; Suzuki, Shohei; Okino, Teruaki; Ohkubo, Yukiharu; Shimoda, Toshimasa; Tanida, Toru; Watanabe, Yoichi; Kohama, Yoshiaki; Ohmori, Kaoru; [...]

    Full-field exposure performance of electron projection lithography tool

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    American Vacuum Society, 2004

    Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

  3. Suzuki, Kazuaki; Fujiwara, Tomoharu; Kojima, Shinichi; Hirayanagi, Noriyuki; Yahiro, Takehisa; Udagawa, Jin; Shimizu, Sumito; Yamamoto, Hajime; Suzuki, Motoko; Takekoshi, Hidekazu; Fukui, Saori; Hamashima, Muneki; Ikeda, Junji; Okino, Teruaki; Shimizu, Hiroyasu; Takahashi, Shinichi; Yamada, Atsushi; Umemoto, Takaaki; Katagiri, Satoshi; Ohkubo, Yukiharu; Shimoda, Toshimasa; Hirose, Keiichi; Tanida, Toru; Watanabe, Yoichi; [...]

    First dynamic exposure results from an electron projection lithography tool

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    American Vacuum Society, 2003

    Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena