Media type: E-Article Title: Chemical vapor deposition of ruthenium-based layers by a single-source approach Contributor: Jeschke, Janine; Möckel, Stefan; Korb, Marcus; Rüffer, Tobias; Assim, Khaybar; Melzer, Marcel; Herwig, Gordon; Georgi, Colin; Schulz, Stefan E.; Lang, Heinrich imprint: Royal Society of Chemistry (RSC), 2016 Published in: Journal of Materials Chemistry C Language: English DOI: 10.1039/c5tc03930d ISSN: 2050-7526; 2050-7534 Keywords: Materials Chemistry ; General Chemistry Origination: Footnote: Description: <p>Single-source precursors Ru(CO)<sub>2</sub>(P(<italic>n</italic>-Bu)<sub>3</sub>)<sub>2</sub>(O<sub>2</sub>CR)<sub>2</sub> allow the successful deposition of Ru(P) layers by the CVD process.</p>