Beschreibung:
<jats:title>Abstract</jats:title><jats:p>We present the first reported investigation exploring the deposition of composite metal/metal oxide thin films using APGD CVD. The approach taken employs a parallel‐plate dielectric barrier configuration, and the deposition of such materials is discussed with respect to their influence on discharge conditions. Controlled and variable composition films were produced based on aluminium which showed metallic‐like reflection (up to 60% visible), and were conductive (≈1 Ω per square). The films are analysed by RBS, SEM, AFM and optical spectroscopy. This new class of APGD‐CVD‐derived thin‐film material, when combined with the associated low thermal load and attractions for industrial scaling, offers significant potential for new applications.</jats:p><jats:p><jats:boxed-text content-type="graphic" position="anchor"><jats:graphic xmlns:xlink="http://www.w3.org/1999/xlink" mimetype="image/jpeg" position="anchor" specific-use="enlarged-web-image" xlink:href="graphic/mgra001.jpg"><jats:alt-text>magnified image</jats:alt-text></jats:graphic></jats:boxed-text>
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