Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

Medientyp: E-Artikel
Titel: Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
Beteiligte: Yamauchi, Kazuto; Yamamura, Kazuya; Mimura, Hidekazu; Sano, Yasuhisa; Saito, Akira; Endo, Katsuyoshi; Souvorov, Alexei; Yabashi, Makina; Tamasaku, Kenji; Ishikawa, Tetsuya; Mori, Yuzo
Erschienen: IOP Publishing, 2003
Erschienen in: Japanese Journal of Applied Physics
Sprache: Englisch
DOI: 10.1143/jjap.42.7129
ISSN: 0021-4922; 1347-4065
Schlagwörter: General Physics and Astronomy ; Physics and Astronomy (miscellaneous) ; General Engineering
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