• Medientyp: E-Artikel
  • Titel: (Invited) Recent Advances in the Modeling of ZnSySe1-y / GaAs (001) Heterostructures with Application to Dislocation Sidewall Gettering
  • Beteiligte: Ayers, John; Kujofsa, Tedi; Raphael, Johanna
  • Erschienen: The Electrochemical Society, 2021
  • Erschienen in: ECS Meeting Abstracts
  • Sprache: Nicht zu entscheiden
  • DOI: 10.1149/ma2021-01331080mtgabs
  • ISSN: 2151-2043
  • Schlagwörter: General Medicine
  • Entstehung:
  • Anmerkungen:
  • Beschreibung: <jats:p> In this talk we will describe state-of-the-art approaches to the modeling of strain relaxation and dislocations in ZnS<jats:sub>y</jats:sub>Se<jats:sub>1-y</jats:sub>/GaAs (001) heterostructures, with applications to dislocation sidewall gettering (DSG) in devices. Current modeling approaches are based on the extension of the original Dodson and Tsao plastic flow model [B. W. Dodson and J. Y. Tsao, Appl. Phys. Lett., 51, 1325 (1987); Appl. Phys. Lett., 52, 852 (1988)] to include compositional grading and multilayers, dislocation interactions, and differential thermal expansion. Important recent breakthroughs have greatly enhanced the utility of these modeling approaches in three respects: i) pinning interactions have been included in graded and multilayered structures, providing a better description of the rate of strain relaxation as well as the limiting strain; ii) a refined model describing the interaction length for dislocation-dislocation interactions was formulated to include jogging in compositionally-graded and step-graded layers; and iii) inclusion of back-and-forth weaving of dislocations provides a more accurate description of heterostructures containing strain reversals, such as strained-layer superlattices or overshoot graded layers. We will describe these three key advances and use reasonable estimates of the kinetic parameters for ZnS<jats:sub>y</jats:sub>Se<jats:sub>1-y</jats:sub> to explain and illustrate practical features of dislocation sidewall gettering in II-VI heterostructures. </jats:p>
  • Zugangsstatus: Freier Zugang