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Suzuki, Kazuaki; Fujiwara, Tomoharu; Kojima, Shinichi; Hirayanagi, Noriyuki; Yahiro, Takehisa; Udagawa, Jin; Shimizu, Sumito; Yamamoto, Hajime; Suzuki, Motoko; Takekoshi, Hidekazu; Fukui, Saori; Hamashima, Muneki; Ikeda, Junji; Okino, Teruaki; Shimizu, Hiroyasu; Takahashi, Shinichi; Yamada, Atsushi; Umemoto, Takaaki; Katagiri, Satoshi; Ohkubo, Yukiharu; Shimoda, Toshimasa; Hirose, Keiichi; Tanida, Toru; Watanabe, Yoichi; [...]

First dynamic exposure results from an electron projection lithography tool

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  • Medientyp: E-Artikel
  • Titel: First dynamic exposure results from an electron projection lithography tool
  • Beteiligte: Suzuki, Kazuaki; Fujiwara, Tomoharu; Kojima, Shinichi; Hirayanagi, Noriyuki; Yahiro, Takehisa; Udagawa, Jin; Shimizu, Sumito; Yamamoto, Hajime; Suzuki, Motoko; Takekoshi, Hidekazu; Fukui, Saori; Hamashima, Muneki; Ikeda, Junji; Okino, Teruaki; Shimizu, Hiroyasu; Takahashi, Shinichi; Yamada, Atsushi; Umemoto, Takaaki; Katagiri, Satoshi; Ohkubo, Yukiharu; Shimoda, Toshimasa; Hirose, Keiichi; Tanida, Toru; Watanabe, Yoichi; [...]
  • Erschienen: American Vacuum Society, 2003
  • Erschienen in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
  • Sprache: Englisch
  • DOI: 10.1116/1.1629287
  • ISSN: 1071-1023; 1520-8567
  • Schlagwörter: Electrical and Electronic Engineering ; Condensed Matter Physics
  • Entstehung:
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  • Beschreibung: <jats:p>Electron projection lithography (EPL) is one of the promising technologies below the 65 nm node, especially for contact hole and gate layers. Nikon is developing an EPL exposure tool as an electron beam (EB) stepper and the first generation EB stepper is now being manufactured. The voltage of 100 kV is adopted for electron beam acceleration. The subfield size is 0.25 mm×0.25 mm on the wafer and the deflection width of the electron beam is 5 mm on the wafer. The magnification of the projection optics is 1/4. A 5 mm×25 mm area from the φ200 mm reticle can be exposed by the combination of beam deflection and stage scanning motion (dynamic exposure). This area is called “a mechanical stripe.” After one mechanical stripe exposure, the reticle and wafer stages turn around and the next exposure of the adjacent mechanical stripe starts as a scan and stitch stage motion. Finally, a 20 mm×25 mm exposure field from the φ200 mm reticle is exposed. We report the first dynamic exposure in the history of EPL although only a φ100 mm reticle was used. A 5 mm×10 mm area was used as the mechanical stripe and 10 mm×10 mm exposure fields were exposed. 100 nm nested lines were resolved in the entire exposure field and stitching accuracies of 17–18 nm (3σ) are obtained. There remain systematic errors, and stitching accuracy less than 15 nm will be achieved after fine adjustment of the subfield positions. We feel the reality of EPL is now sufficiently proven.</jats:p>