Beschreibung:
<jats:p>We study the surface morphology and growth process of SiGe nanoislands on TiO2 films, deposited over Si (001) substrates by high power impulse magnetron sputtering, followed by varying annealing parameters (i.e., 500–750 °C for 30 min to 20 h). Structural analysis was performed by atomic force microscopy, scanning electron microscopy, and grazing incidence x-ray diffraction. Two structural schemes were taken into consideration, i.e., SiGe grown over pre-annealed TiO2 (scheme I) and as-grown TiO2 (scheme II). Photoluminescence (PL) study of the structures revealed spectral features comprised of multiple peak features related to localized and surface states within the oxide layer, along with a peak due to the SiGe nano-islands. It was observed that the spectral feature and intensity depend on the surface morphology and the crystallinity of the underlying TiO2 layer. The structures were subjected to low temperature PL measurements, and the spectra were de-convoluted in order to validate the origin of the obtained spectra. Structural analysis revealed that pre-annealing the underlying polycrystalline TiO2 film, prior to deposition of SiGe layers (scheme I), facilitates the formation of SiGe nanoislands, preferably along the grain boundaries (due to their higher interfacial energy). In comparison, for the case of SiGe deposited over as-grown TiO2 (scheme II), annealing of the structure resulted in random distribution of nanoislands across the entire film. The size of the nanoislands grew with increased annealing time up until the point they started to coalesce, forming discontinuous SiGe layers and eventually leading to melting of the layer.</jats:p>