Beschreibung:
<jats:p>High-quality GaAs-AlxGa1−xAs heterostructures for metal-semiconductor field-effect transistor (MESFET) applications have been grown by metalorganic vapor-phase epitaxy. High electron Hall mobility of up to 4000 cm2/(V s) for a carrier concentration of 3.5×1017 cm−3 was obtained for Si-doped GaAs grown on AlxGa1−xAs. It was learned that the electron Hall mobility of GaAs is not dependent on the Al composition of the AlxGa1−xAs buffer layer for 0≤x≤0.8. Good drain current-voltage saturation characteristics were observed for GaAs MESFETs with a 0.3-μm gate length and AlxGa1−xAs buffer layers. At drain voltages below 3 V, the drain conductance was at its lowest for Al composition around x=0.6. However, an anomalous peak in the drain conductance was observed at drain voltages of 3–6 V and at Al compositions of x=0.6 and 0.8. Drain conductance also increased as x did for x≥0.45 when measured at a microwave frequency. These phenomena can be understood by considering electron injection into the buffer/substrate region from the GaAs channel. The amount of this injection coincided well with the reduction in the conduction-band energy barrier at the GaAs-AlxGa1−xAs heterointerface for x&gt;0.45 for electron transport.</jats:p>