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  1. Landis, Stefan [Editor]

    Nano-lithography

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    Hoboken, NJ: Wiley, 2011 ; London: ISTE [u.a.], 2011

  2. Ma, Xu [Author]; Arce, Gonzalo R. [Author]

    Computational lithography

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    Hoboken, NJ: Wiley, 2010

    Published in: Wiley series in pure and applied optics